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- 库存：
160
- 英文名：
Multilayer h-BN (Boron Nitride) film grown in copper foil
- CAS号：
7440-42-8
- 保质期：
1年
- 供应商：
江西江蓝纯生物试剂有限公司
- 保存条件：
常温干燥避光
英文名称： Multilayer h-BN (Boron Nitride) film grown in copper foil
CAS号： 7440-42-8
包 装： 1盒
参 数
面 积： 5cmx2.5cm
保质期： 1年常温干燥避光
江蓝纯生物为您提供高质量的铜基多层六角氮化硼薄膜，六角氮化硼结构是类石墨烯结构，具有很高的研究价值，也可以用转移石墨烯的方法转移六角氮化硼材料。表征完备，质量可靠。
h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strength and thermal conductivity of h-BN has been reported to be close to that of graphene. h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 °C (in contrast, for graphene the corresponding temperature is 600 °C).
During Chemical Vapor Deposition, BN is grown on both sides of the copper foil
Specifications:
· Close to complete coverage (90-95%), with some minor holes
· Average Thickness of BN film is 13 nm
· Thickness of the copper foil is 20 microns
· Quality is confirmed by TEM. TEM shows perfect hexagonal structure.
TEM image of perfect hexagonal structure
AFM image of multilayer BN on Cu
AFM scan of multilayer BN on Cu
If transferred onto an SiO2 substrate, the BN film may be seen as a white film. However, it is difficult to recognize the BN film on copper using a microscope.
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