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- 详细信息
- 文献和实验
- 技术资料
- 英文名:
Silicon/Silicon Dioxide Wafer (5 Pack)
- 库存:
1
- 供应商:
甄准生物
- CAS号:
Oxide Thickness: 90 nm; Color: Violet; Wafer Tickness: 450 µm; Resistivity: 1-10 ohm-cm ; Type/Dopant: N ; Orientation: <100> ; Front Surface: Polished; Back Surface: Etched;
- 保存条件:
-20°C Freezer
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文献和实验DNA-Modified Single Crystal and Nanoporous Silicon
The functionalization of silicon as elemental crystalline wafer, nanoporous layers, or nanocrystalline particles with DNA oligonucleotides using automated solid phase synthesis is described. The procedures provide semiconductor surfaces
Zwitterionic phospholipid vesicles are known to adsorb and ultimately rupture on flat silicon dioxide (SiO2 ) surfaces to form supported lipid bilayers. Surface topography, however, alters the kinetics and mechanistic details of vesicles
Fabrication of Microelectrodes Using the Lift-Off Technique
The lift-off technique is one of the most prevalent methods for fabricating microelectrodes on a flat surface (e.g., a silicon [Si] wafer). It represents an alternative for metaletching techniques that often utilize hazardous chemicals
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